1.

Conference Proceedings
Conference Proceedings
1. Photomask ADI, AEI, and QA measurements using normal incidence optical CD metrology
Apak, E. ; Sarathy, T.P. ; McGahan, W.A. ; Rovira, P.I. ; Hoobler, R.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.708-719,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. Optical critical dimension (OCD) measurments for profile monitoring and control: applications for mask inspection and fabrication
Hoobler, R.J. ; Apak, E.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.638-645,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256