1.

Conference Proceedings
Conference Proceedings
1. Study of the effect of amine additives on LWR and LER [6153-44]
Houlihan, F. M. ; Rentkiewicz, D. ; Lin, G. ; Rahman, D. ; Mackenzie, D. ; Timko, A. ; Kudo, T. ; Anyadiegwu, C. ; Thiyagarajan, M. ; Chiu, S. ; Romano, A. ; Dammel, R. R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.615317-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
2.

Conference Proceedings
Conference Proceedings
2. Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]
Kudo, T. ; Lin, G. ; Lee, D. ; Rahman, D. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Chiu, S. ; Houlihan, F. ; Rentkiewicz, D. ; Dammel, R. R. ; Padmanaban, M. ; Biafore, J.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61532C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
3.

Conference Proceedings
Conference Proceedings
3. Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions
Masuda, S. ; Kobayashi, M. ; Kim, W.-K. ; Anyadiegwu, C. ; Padmanaban, M. ; Dammel, R.R. ; Tanaka, K. ; Yamada, Y.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.819-829,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. PEB sensitivity studies of ArF resists: II. Polymer and solvent effects
Hong, C.-S. ; Lee, S.-H. ; Kim, W.-K. ; Kudo, T. ; Timko, A. ; Mckenzie, D. ; Anyadiegwu, C. ; Rahman, D.M. ; Lin, G. ; Dammel, R.R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1131-1137,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. PEB sensitivity studies of ArF resist
Lee, S.H. ; Kim, W.-K. ; Rahman, D.M. ; Kudo, T. ; Timko, A. ; Anyadiegwu, C. ; McKenzie, D.S. ; Kanda, T. ; Dammel, R.R. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.798-806,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039