Kittl, J. A. ; Lauwers, A. ; Pawlak, M. A. ; Demeurisse, C. ; Anil, K. G. ; Veloso, A. ; van Dal, M. J. H. ; Schram, T. ; Brijs, B. ; Kaiser, M. ; Kubicek, S. ; Cunniffe, J. ; Verbeeck, R. ; Vrancken, C. ; Biesemans, S. ; Maex, K.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.225-232, 2005. Pennington, NJ. Electrochemical Society
Pawlak, M. ; Kittl, J. A. ; Janssens, T. ; Lauwers, A. ; Vandervorst, W. ; Anil, K. G. ; Schram, T. ; Veloso, A. ; van Dal, M.J. H. ; Maex, K. ; Vantomme, A.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.241-248, 2005. Pennington, NJ. Electrochemical Society