1.

Conference Proceedings
Conference Proceedings
1. Integrated phase shift measurements for advanced mask etch process control
Sahin, T. ; Collard, C. ; Anderson, S.A. ; Mak, A.W. ; Brooks, C.B. ; Buie, M.J. ; Walsh, P. ; Li, G.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.76-84,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
2.

Conference Proceedings
Conference Proceedings
2. Optimization of a 65-nm alternating phase-shift quartz etch process
Anderson, S.A. ; Anderson, S.A., III ; Buie, M.J. ; Chandrachood, M. ; Clevenger, J.O. ; Lee, Y. ; Sandlin, N.L. ; Ding, J.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.66-75,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
3.

Conference Proceedings
Conference Proceedings
3. Examination of various endpoint methods for chrome mask etch
Collard, C. ; Anderson, S.A. ; Anderson, R.B., III ; Clevenger, J.O. ; Halim, M. ; Brooks, C.B. ; Buie, M.J. ; Sahin, T.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.744-748,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256