1.

Conference Proceedings
Conference Proceedings
1. E-beam curing effects on the etch and CD-SEM stability of 193-nm resists
Padmanaban, M. ; Alemy, E. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; McKenzie, D.S. ; Orsi, A. ; Rahman, D. ; Chen, W.-L. ; Sadjadi, R.M. ; Livesay, W.R. ; Ross, M.F.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.606-614,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate
Rahman, M.D. ; Alemy, E. ; Conley, W. ; Miller, D. ; Dammel, R.R. ; Kim, W.-K. ; Kudo, T. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Padmanaban, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.127-135,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690