1.

Conference Proceedings
Conference Proceedings
1. Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
Tateno, M. ; Takayama, N. ; Murakami, S. ; Hatta, K. ; Akima, S. ; Matsuo, F. ; Otaki, M. ; Kim, B.-G. ; Tanaka, K. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.446-453,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Defect printability and inspection capability for tri-tone PSM
Nagamura, Y. ; Maetoko, K. ; Maeshima, K. ; Tamada, N. ; Hosono, K. ; Fujimoto, M. ; Kodera, Y. ; Goto, K. ; Narita, T. ; Matsuo, F. ; Akima, S. ; Ishijima, M. ; Iwasaki, H. ; Kikuchi, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.454-465,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Mask inspection challenges for 90- and 130-nm device technology nodes: inspection sensitivity and printability study using SEMI standard programmed defect masks
Kim, W.D. ; Akima, S. ; Aquino, C.M. ; Becker, C. ; Eickhotf, M.D. ; Narita, T. ; Quah, S.-K. ; Rohr, P.M. ; Schlaffer, R. ; Tanzawa, J. ; Yamada, Y.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.972-983,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
4.

Conference Proceedings
Conference Proceedings
4. Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)
Akima, S. ; Komizo, T. ; Kawakita, S. ; Kodera, Y. ; Narita, T. ; Ishikawa, K.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.23-35,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
5.

Conference Proceedings
Conference Proceedings
5. DUV inspection capability for 90-nm node mask in ArF lithography
Ohira, K. ; Kim, B.G. ; Tanaka, K. ; Yoshioka, N. ; Tateno, M. ; Takayama, N. ; Murakami, S. ; Hatta, K. ; Akima, S. ; Matsuo, F. ; Otaki, M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1181-1190,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256