Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
- Author(s):
Magg,C. ( Photronics/IBM Microelectronics ) Lercel,M.J. Lawliss,M. Ackel,R. Caldwell,N. Kindt,L. Racette,K.C. Williams,C. Reu,P.L. - Publication title:
- Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4343
- Pub. Year:
- 2001
- Page(from):
- 374
- Page(to):
- 382
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440297 [0819440299]
- Language:
- English
- Call no.:
- P63600/4343
- Type:
- Conference Proceedings
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