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Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan. pp.173-177, 1997. Bellingham, Washington. SPIE-The International Society for Optical Engineering
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Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.256-265, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
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Smart electronics and MEMS II : 13-15 December 2000, Melbourne, Australia. pp.286-293, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
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High Purity Silicon VI : proceedings of the sixth International Symposium. pp.491-500, 2000. Pennington, N.J., Bellingham, Wash.. Electrochemical Society — SPIE-The International Society for Optical Engineering
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