1.

Conference Proceedings
Conference Proceedings
1. Evaluation of TF11 attenuated-PSM mask blanks with DUV laser patterning
K. Xing ; C. Björnberg ; H. Karlsson ; A. Paulsson ; P. Beiming
Pub. info.: Photomask and next-generation lithography mask technology XV.  2  pp.70281Z-1-70281Z-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7028
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of attenuated PSM photomask blanks with TF11 chrome and FEP-171 resist on a 248 nm DUV laser pattern generator
K. Xing ; C. Björnborg ; H. Karlsson ; A. Paulsson ; A. Rosendahl
Pub. info.: Photomask technology 2007.  3  pp.67303Z-1-67303Z-8,  2007.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6730