1.

Conference Proceedings
Conference Proceedings
1. Particle Removal from Micrometer-Sized Trenches Using High-Velocity-Aerosol Cleaning and Comparison with Megasonic Tank Cleaning
K.L. Wostyn ; K. Sano ; A. Eitoku ; T. Janssens ; T. Bearda
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.55-60,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
2.

Conference Proceedings
Conference Proceedings
2. SINGLE - WAFER WET CLEANING FOR A HIGH PARTICLE REMOVAL EFFICIENCY ON HYDROPHOBIC SURFACE
K. Sano ; A. Izumi ; A. Eitoku ; J. Snow ; E. Kesters ; P. Mertens
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.134-141,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)