1.

Conference Proceedings
Conference Proceedings
1. The potentials of helium ion microscopy for semiconductor process metrology
M. T. Postek ; A. E. Vladár
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220B-1-69220B-7,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
2.

Conference Proceedings
Conference Proceedings
2. Contamination specification for dimensional metrology SEMs
A. E. Vladár ; K. P. Purushotham ; M. T. Postek
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.692217-1-692217-5,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
3.

Conference Proceedings
Conference Proceedings
3. Accurate and traceable dimensional metrology with a reference CD-SEM
A. E. Vladár ; J. S. Villarrubia ; P. Cizmar ; M. Oral ; M. T. Postek
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220H-1-69220H-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922