1.

Conference Proceedings
Conference Proceedings
1. Optimal proximity correction: application for flash memory design
Chen,Y.G. ; Huang,D.L. ; Sung,K.T. ; Chiang,J.J. ; Yu,M. ; Teng,F. ; Chu,L. ; Rey,J.C. ; Bernard,D.A. ; Li,J. ; Moroz,V. ; Boksha,V.V.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.874-884,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Comparison of different optical proximity correction models with three-dimensional photolithography simulation over planar substrates (Invited Paper)
Rey,J.C. ; Li,J. ; Boksha,V.V. ; Bernard,D.A.
Pub. info.: Microlithographic Techniques in IC Fabrication.  pp.68-81,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3183
3.

Conference Proceedings
Conference Proceedings
3. Sub-half-micron contact window design with 3D photolithography simulator
Brainerd,S.K. ; Bernard,D.A. ; Rey,J.C. ; Li,J. ; Granik,Y. ; Boksha,V.V.
Pub. info.: Optical Microlithography X.  pp.552-566,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
4.

Conference Proceedings
Conference Proceedings
4. Model-based optical proximity correction including effects of photoresist processes
Li,J. ; Bernard,D.A. ; Rey,J.C. ; Boksha,V.V.
Pub. info.: Optical Microlithography X.  pp.643-651,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
5.

Conference Proceedings
Conference Proceedings
5. Efficient computational techniques for aerial imaging simulation
Bernard,D.A. ; Li,J. ; Rey,J.C. ; Rouz,K. ; Axelrad,V.
Pub. info.: Optical Microlithography IX.  Part1  pp.273-287,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726