Modification of photoresist profile in lift-off process for MEMS application

Modification of photoresist profile in lift-off process for MEMS application

Author(s):

Nagarajan, R. ( Institute of Microelectronics (Singapore) )
Kumar, R. ( Institute of Microelectronics (Singapore) )

Publication title:

Nano- and Microtechnology: Materials, Processes, Packaging, and Systems

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4936

Pub. Year:

2002

Page(from):

159

Page(to):

167

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819447319 [0819447315]

Language:

English

Call no.:

P63600/4936

Type:

Conference Proceedings

Details

TDL ID:	ZA00012920
Series ID:	PA00000029
Conf. info. (Name):	Smart Materials, Nano-, and Micro- Smart Systems : Nano- and microtechnology
Conf. info. (Number):	2002
Conf. info. (Venue):	Melbourne, Australia
Conf. info. (Date):	2002.12.16-2002.12.18

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