1.

Conference Proceedings
Conference Proceedings
1. Effects of alternating aperture PSM design on image imbalance for 65-nm technology
Kroyan, A. ; Liu, H.-Y.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1217-1226,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
2.

Conference Proceedings
Conference Proceedings
2. Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node
Driessen, F.A. ; van Adrichem, P. ; Philipsen, V. ; Jonckheere, R. ; Liu, H.-Y. ; Karklin, L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1180-1189,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691