1.

Conference Proceedings
Conference Proceedings
1. Influence of Trenching Effect on the Characteristics of Buried-Gate SiC Junction Field-Effect Transistors
Koo, S.-M. ; Lee, S.-K. ; Zetterling, C.-M. ; Ostling, M. ; Forsberg, U. ; Janzen, E.
Pub. info.: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.1235-1238,  2002.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 389-393
2.

Conference Proceedings
Conference Proceedings
2. Reduction of the Barrier Height and Enhancement of Tunneling Current of Titanium Contacts Using Embedded Au Nano-Particles on 4H and 6H Silicon Carbide
Lee, S.-K. ; Zetterling, C.-M. ; OEstling, M. ; Fusegawa, I. ; Magnusson, M.H. ; Deppert, K. ; Wernersson, L.-E. ; Samuelson, L. ; Litwin, A.
Pub. info.: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.937-940,  2002.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 389-393
3.

Conference Proceedings
Conference Proceedings
3. Biomedical applications of electroactive polymers and shape-memory alloys (Invited Paper)
Lee, S.-K. ; Lee, S.-J. ; An, H.-J. ; Cha, S.-E. ; Chang, J.K. ; Kim, B. ; Pak, J.J.
Pub. info.: Smart structures and materials 2002 : electroactive polymer actuators and devices (EAPAD) : 18-21 March 2002, San Diego, USA.  pp.17-31,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4695
4.

Conference Proceedings
Conference Proceedings
4. Reduction of the Barrier Height and Enhancement of Tunneling Current of Titanium Contacts Using Embedded Au Nano-Particles on 4H and 6H Silicon Carbide
Lee, S.-K. ; Zetterling, C.-M. ; Ostling, M. ; Fusegawa, I. ; Magnusson, M.H. ; Deppert, K. ; Wernersson, L.-E. ; Samuelson, L. ; Litwin, A.
Pub. info.: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.937-940,  2002.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 389-393
5.

Conference Proceedings
Conference Proceedings
5. The Role of Textures in the Corrosion Resistance of Electrogalvanized Zn Coatings
Hong, S.-H. ; Kim, J.B. ; Lee, S.-K.
Pub. info.: Textures of materials : ICOTOM 13 : proceedings of the 13th International Conference on Textures of Materials, Seoul, Korea, August 26-30, 2002.  pp.1025-1030,  2002.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 408-412
6.

Conference Proceedings
Conference Proceedings
6. Influence of Trenching Effect on the Characteristics of Buried-Gate SiC Junction Field-Effect Transistors
Koo, S.-M. ; Lee, S.-K. ; Zetterling, C.-M. ; OEstling, M. ; Forsberg, U. ; Janzen, E.
Pub. info.: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.1235-1238,  2002.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 389-393
7.

Conference Proceedings
Conference Proceedings
7. Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
Hwang, Y.-S. ; Jung, J.-C. ; Park, K.-D. ; Lee, S.-K. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S. ; Ding, S.-J. ; Xiang, Z. ; Neisser, M.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1119-1125,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
8.

Conference Proceedings
Conference Proceedings
8. Contact hole patterning performance of ArF resist for 0.10μm technology node
Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Lee, G.-S. ; Lee, S.-K. ; Hwang, Y.-S. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.577-585,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
9.

Conference Proceedings
Conference Proceedings
9. 100-nm device fabrication using ArF resist
Lee, S.-K. ; Jung, J.-C. ; Hwang, Y.-S. ; Park, K.-D. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.571-576,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
10.

Conference Proceedings
Conference Proceedings
10. Combination of rotational, angular, and shift-multiplexing methods in photopolymer films
Lim, K.-S. ; Choi, K.-H. ; Lee, S.-K. ; Son, C.-W. ; Chung, S.-J. ; Tak, S.-J.
Pub. info.: Practical Holography XVI and Holographic Materials VIII.  pp.428-435,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4659
11.

Conference Proceedings
Conference Proceedings
11. Optically injection mode-locked 1.3-μm semiconductor optical amplifier fiber ring laser by using gain-switched single-mode FPLD
Hsueh, P.-S. ; Lee, S.-K. ; Lin, G.-R.
Pub. info.: Semiconductor Lasers and Applications.  pp.48-53,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4913
12.

Conference Proceedings
Conference Proceedings
12. Fluorocarbon-based single-layer resist for 157-nm lithography
Song, K.Y. ; Yoon, K.-S. ; Choi, S.-J. ; Woo, S.-G. ; Han, W.-S. ; Lee, J.-J. ; Lee, S.-K. ; Noh, C.-H. ; Honda, K.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.504-511,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
13.

Conference Proceedings
Conference Proceedings
13. Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists
Kudo, T. ; Alemy, E.L. ; Dammel, R.R. ; Kim, W.-K. ; Lee, S.-H. ; Masuda, S. ; McKenzie, D.S. ; Rahman, M.D. ; Romano, A.R. ; Padmanaban, M. ; Chun, J.-S. ; Jung, J.-C. ; Lee, S.-K. ; Shin, K.-S. ; Kim, H.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.150-159,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
14.

Conference Proceedings
Conference Proceedings
14. Amine gradient process for 157-nm lithography
Jung, J.-C. ; Kong, K.-K. ; Hwang, Y.-S. ; Park, K.-D. ; Lee, S.-K. ; Lee, G.S. ; Kim, J.S. ; Shin, K.-S.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.212-220,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690