Fluorocarbon-based single-layer resist for 157-nm lithography
- Author(s):
Song, K.Y. ( Samsung Electronics Co., Ltd. (Korea) ) Yoon, K.-S. Choi, S.-J. Woo, S.-G. Han, W.-S. Lee, J.-J. ( Samsung Advanced Institute of Technology (Korea) ) Lee, S.-K. Noh, C.-H. Honda, K. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 504
- Page(to):
- 511
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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