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11 results

Conference Proceedings

1. KrF lithography for 130 nm

Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.192-205, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Status of ArF lithography for the 130-nm technology node

Ronse,K. ; Vandenberghe,G. ; Jaenen,P. ; Delvaux,C. ; Vangoidsenhoven,D. ; Roey,F.Van ; Pollers,I. ; Maenhoudt,M. ; Goethals,A.M. ; Pollentier,I.K. ; Vleeming,B. ; Schenau,K.van lngen ; Heskamp,B. ; Davies,G. ; Niroomand,A.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.410-422, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Limits of optical lithography

Maenhoudt,M. ; Verhaegen,S. ; Ronse,K. ; Zandbergen,P. ; Muzio,E.G.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.373-387, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. Front-end-of-line process development using 193-nm lithography

Pollentier,I.K. ; Ercken,M. ; Eliat,A. ; Delvaux,C. ; Jaenen,P. ; Ronse,K.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.56-67, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

5. Lithography aspects of dual-damascene interconnect technology

Maenhoudt,M. ; Goidsenhoven,D.Van ; Pollentier,I.K. ; Ronse,K. ; Lepage,M. ; Struyf,H. ; Hove,M.Van

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.1-13, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

6. ArF lithography options for 100-nm technologies

Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.

Pub. info.:	Optical Microlithography XIV. 4346 pp.179-190, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

7. CD control for two-dimensional features in future technology nodes

Verhaegen,S. ; Gordon,R.L. ; Jonckheere,R.M. ; McCallum,M. ; Ronse,K.

Pub. info.:	Optical Microlithography XIV. 4346 pp.368-378, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

8. Reticle quality needs for advanced 193-nm lithography

Jonckheere,R.M. ; Vandenberghe,G.N. ; Wiaux,V. ; Verhaegen,S. ; Ronse,K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.108-117, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

9. (Sub-) 100-nm gate patterning using 248-nm alternating PSM

Vandenberghe,G.N. ; Jaenen,P. ; Jonckheere,R.M. ; Ronse,K. ; Toublan,O.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.61-69, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

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Conference Proceedings

10. Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM

Kim,Y.-C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Ronse,K.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.954-967, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

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