Practical approach for AAPSM image imbalance correction for sub-100-nm lithography
- Author(s):
Cho, H.L. ( Toppan Chungwha Electronics Co. (Taiwan) ) Lin, S.Y. ( Toppan Chungwha Electronics Co. (Taiwan) ) Hsieh, F. ( Toppan Chunghwa Electronics Co. (Taiwan) ) Kroyan, A. ( Synopsys, Inc. (USA) ) Liu, H.-Y. ( Synopsys, Inc. (USA) ) Huang, J.H. ( Synopsys, Inc. (USA) ) Hsu, S.-H. ( UMC (Taiwan) ) Huang, I-H. ( UMC (Taiwan) ) Lin, B.S.-M. ( UMC (Taiwan) ) Hung, K.-C. ( UMC (Taiwan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5130
- Pub. Year:
- 2003
- Page(from):
- 778
- Page(to):
- 786
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819449962 [0819449962]
- Language:
- English
- Call no.:
- P63600/5130
- Type:
- Conference Proceedings
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