THERMAL STAIN MEASUREMENTS IN EPITAXIAL CoSi2/Si BY DOUBLE CRYSTAL X-RAY DIFFRACTION
- Author(s):
Bai, Gang Nicolet, Marc.-A. Vreeland, Jr. Thad Ye, Q. Kao, Y.C. Wang, K.L. - Publication title:
- Thin films : stresses and mechanical properties : symposium held November 28-30, 1988, Boston, Massachusetts, U.S.A.
- Title of ser.:
- Materials Research Society symposium proceedings
- Ser. no.:
- 130
- Pub. Year:
- 1989
- Page(from):
- 35
- Page(to):
- 40
- Pages:
- 6
- Pub. info.:
- Pittsburgh, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558990036 [1558990038]
- Language:
- English
- Call no.:
- M23500/130
- Type:
- Conference Proceedings
Similar Items:
Materials Research Society |
Materials Research Society |
2
Conference Proceedings
ON THE CRITIAL LAYER THICKNESS OF STRAINED-LAYER HETERO-EPITAXIAL CoSi2 FILMS ONF < 111 > Si
Materials Research Society |
Materials Research Society |
Materials Research Society |
9
Conference Proceedings
Nondestructive measurement of layer thickness in double heterostructures x ray by double crystal diffraction
SPIE-The International Society for Optical Engineering |
Materials Research Society |
Materials Research Society |
Materials Research Society |
11
Conference Proceedings
IN-SITU X-RAY DIFFRACTION AND RESISTIVITY ANALYSIS OF CoSi2 PHASE FORMATION WITH AND WITHOUT A Ti INTERLAYER AT RAPID THERMAL ANNEALING RATES
MRS - Materials Research Society |
Materials Research Society |
12
Conference Proceedings
INVESTIGATION OF INTERFACE STATES ON MBE CoSi2/Si SCHOTTKY CONTACTS BY FORWARD BIAS CAPACITANCE MEASUREMENT
Materials Research Society |