Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell
- Author(s):
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chung, D.-H. Cha, D.-C. Kim, H.-S. Park, J.-S. Nam, D.-G. Woo, S.-K. Cho, H.-S. Han, W.-S. - Publication title:
- 22nd Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4889
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1253
- Page(to):
- 1262
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- Language:
- English
- Call no.:
- P63600/4889
- Type:
- Conference Proceedings
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