Impact of photoresist taper and implant tilt angle on the interwell isolation of subquartermicron CMOS technologies

Impact of photoresist taper and implant tilt angle on the interwell isolation of subquartermicron CMOS technologies

Author(s):

Gilbert,P. ( Motorola )

Grant,J. ( Motorola )

Tsui,P. ( Motorola )

King,C. ( Motorola )

Taylor,W. ( Motorola )

Wimmer,K. ( Motorola )

1 more

Publication title:

Microelectronic Device Technology : 1-2 October 1997, Austin, Texas

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

3212

Pub. Year:

1997

Page(from):

228

Page(to):

235

Pub. info.:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819426444 [081942644X]

Language:

English

Call no.:

P63600/3212

Type:

Conference Proceedings

Details

TDL ID:	ZA00018328
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing : Microelectronic Device Technology
Conf. info. (Number):	1997
Conf. info. (Venue):	Austin, TX, USA
Conf. info. (Date):	1997.10.01-1997.10.02

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