Claypool, J. B. ; Weimer, M. ; Krishnamurthy, V. ; Gehoel, W. ; Schenau, K. van Ingen
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Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.52-63, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
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Proceedings of SPIE - the International Society for Optical Engineering
Sullivan, G. J. ; Ikhlassi, A. ; Bergman, J. ; DeWames, R. E. ; Waldrop, J. R. ; Grein, C. ; Flatte, M. ; Mahalingam, K. ; Yang, H. ; Zhong, M. ; Weimer, M.
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Infrared technology and applications XXXI : 28 March-1 April 2005, Orlando, Florida, USA. pp.131-137, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering