Toward a unified advanced CD-SEM specification for sub-0.18-ヲフm technology
- Author(s):
Allgair,J. ( Motorola ) Archie,C.N. ( IBM Corp. ) Banke,W. ( IBM Corp. ) Bogardus,H. ( SEMATECH ) Griffith,J.E. ( Lucent Technologies/Bell Labs. ) Marchman,H.M. ( Texas Instruments Inc. ) Postek,M.T. ( National Institute of Standards and Technology ) Saraf,L.H. ( SEMATECH ) Schlesinger,J.E. ( Texas Instruments Inc. ) Singh,B. ( Advanced Micro Devices,Inc. ) Sullivan,N.T. ( Digital Equipment Corp. ) Trimble,L.E. ( Lucent Technologies/Bell Labs. ) Vladar,A.E. ( Hewlett-Packard Co. ) Yanof,A.W. ( Motorola ) - Publication title:
- Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3332
- Pub. Year:
- 1998
- Page(from):
- 138
- Page(to):
- 150
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427779 [0819427772]
- Language:
- English
- Call no.:
- P63600/3332
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ヲフm lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
2
Conference Proceedings
Benchmarking of advanced CD-SEMs against a new unified specification for sub-0.18-μm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Monitoring printing fidelity with image correlation measurements on the CD SEM
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Application of statistical metrology to reduce total uncertainty in the CD-SEM measurement of across-chip linewidth variation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |