Gaiseanu, F. ; Dimitriadis, C.A. ; Stoemenos, J. ; Postolache, C. ; Tsoukalas, D. ; Kruger, D. ; Tsoi, E.
Pub. info.:
Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.1289-1296, 1997. Pennington, NJ. Electrochemical Society
Tsoukalas, D. ; Tsamis, C. ; Kouvatsos, D. ; Skarlatos, D.
Pub. info.:
Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology. pp.348-358, 1996. Pennington, NJ. Electrochemical Society
Skarlatos, D. ; Omri, M. ; Tsamis, C. ; Claverie, A. ; Tsoukalas, D.
Pub. info.:
Silicon materials science and technology : proceedings of the Eighth International Symposium on Silicon Materials Science and Technology. pp.914-925, 1998. Pennington, NJ. Electrochemical Society
Dimitrakis, P. ; Hatzandroulis, S. ; Tsoukalas, D. ; Stoimenos, J. ; Papaioannou, G.J.
Pub. info.:
Proceedings of the Fourth International Symposium on Semiconductor Wafer Bonding : science, technology, and applications. pp.373-380, 1997. Pennington, NJ. Electrochemical Society
Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A.. pp.133-, 1997. Pittsburg, Pa.. MRS - Materials Research Society
Skarlatos, D. ; Giles, L. F. ; Tsamis, C. ; Claverie, A. ; Tsoukalas, D.
Pub. info.:
Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A.. pp.289-, 1999. Warrendale, PA. MRS - Materials Research Society