1.

Conference Proceedings
Conference Proceedings
1. AN ASSESSMENT OF ECR ARGON PLASMA ETCHING DAMAGE ON Si AND SiO2 INTERFACES
Nam, C. W. ; Ashok, S. ; Tsai, W. ; Day, M.E.
Pub. info.: Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A..  pp.861-868,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 279
2.

Conference Proceedings
Conference Proceedings
2. PLASMA DIAGNOSTICS AND MODELING OF Ti/Tn REACTIVE SPUTTERING
Tsai, W. ; Fair, J. ; Hodul, D.
Pub. info.: Advanced metallization and processing for semiconductor devices and circuits--II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A..  pp.793-798,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 260
3.

Conference Proceedings
Conference Proceedings
3. Highly Selective Etch of SiO2 for High Aspect Ratio Sub-0.5 um Holes
Zhu, H. ; Mueller, G. ; Nguyen, T. ; Tsai, W.
Pub. info.: Proceedings of the International Symposium on Thin Film Materials, Processes, Reliability, and Applications, Thin Film Processes.  pp.115-120,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-30
4.

Conference Proceedings
Conference Proceedings
4. Simulation of Uniformity and Lifetime Effects in Collimated Sputtering
Tait, R. N. ; Dew, S. K. ; Tsai, W. ; Hodul, D. ; Brett, M. J. ; Smy, T.
Pub. info.: Rapid thermal and integrated processing IV : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.107-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 387
5.

Conference Proceedings
Conference Proceedings
5. EFFECTS OF LOW-TEMPERATURE SURFACE CLEANING USING ECR HYDROGEN PLASMA
Nam, C. W. ; Ashok, S. ; Tsai, W. ; Day, M. E.
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.279-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315
6.

Conference Proceedings
Conference Proceedings
6. Simulation of Uniformity and Lifetime Effects in Collimated Sputtering
Tait, R. N. ; Dew, S. K. ; Tsai, W. ; Hodul, D. ; Brett, M. J. ; Smy, T.
Pub. info.: Modeling and simulation of thin-film processing : symposium held April 17-20, 1995, San Francisco, California, U.S.A..  pp.373-,  1995.  Pittsburgh.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 389