Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system
- Author(s):
Lin, W. ( United Microelectronics Corp. (Taiwan) ) Liao, S. ( United Microelectronics Corp. (Taiwan) ) Tsai, R. ( United Microelectronics Corp. (Taiwan) ) Yeh, M. ( United Microelectronics Corp. (Taiwan) ) Hsieh, C. ( United Microelectronics Corp. (Taiwan) ) Yu, Y. ( United Microelectronics Corp. (Taiwan) ) Lin, B. S. ( United Microelectronics Corp. (Taiwan) ) Fu, S. ( KLA-Tencor Corp. (Taiwan) ) Dziura, T. G. ( KLA-Tencor Corp. (USA) ) - Publication title:
- Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5755
- Pub. Year:
- 2005
- Page(from):
- 138
- Page(to):
- 144
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457356 [0819457353]
- Language:
- English
- Call no.:
- P63600/5755
- Type:
- Conference Proceedings
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