1.
Conference Proceedings
Tanaka,S. ; Sato,H.
Pub. info.:
Optical engineering for sensing and nanotechnology (ICOSN 2001) : 6-8 June 2001, Yokohama, Japan . pp.474-477, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4416
2.
Conference Proceedings
Tanaka,S. ; Fukushima,N. ; Matsushita,J. ; Akatsu,T. ; Niihara,K. ; Yasuda,E.
Pub. info.:
Smart materials . pp.346-354, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4234
3.
Conference Proceedings
Fukushima,N. ; Gomi,T. ; Tanaka,S. ; Matsushita,J.
Pub. info.:
Smart materials . pp.355-363, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4234
4.
Conference Proceedings
Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T. ; Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K.
Pub. info.:
20th Annual BACUS Symposium on Photomask Technology . pp.34-45, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
5.
Conference Proceedings
Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T. ; Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology VII . pp.641-648, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
6.
Conference Proceedings
Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K. ; Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology VII . pp.631-640, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4066
7.
Conference Proceedings
Kyoh,S. ; Tanaka,S. ; Inoue,S. ; Higashikawa,I. ; Mori,I. ; Okumura,K. ; Irie,N. ; Muramatsu,K. ; Ishii,Y. ; Magome,N. ; Umatate,T.
Pub. info.:
20th Annual BACUS Symposium on Photomask Technology . pp.494-502, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4186
8.
Conference Proceedings
Matsunaga,T. ; Enami,T. ; Kakizaki,K. ; Saito,T. ; Tanaka,S. ; Nakarai,H. ; Inoue,T. ; Igarashi,T.
Pub. info.:
Optical Microlithography XIV . 4346 pp.1617-1626, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
9.
Conference Proceedings
Ohmori,R. ; Tanaka,S. ; Watanabe,A. ; Hayakawa,S. ; Sato,H.
Pub. info.:
Optoelectronic Information Systems and Processing . pp.147-152, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4513
10.
Conference Proceedings
Tanaka,S. ; Sato,H.
Pub. info.:
Optoelectronic Information Systems and Processing . pp.153-158, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4513