1.

Conference Proceedings
Conference Proceedings
1. Prospect of Hf-Dared Gate Dielectric by PVD with FUSI Gate for LSTP Application
M. Niwa ; R. Mitsuhashi ; S. Hayashi ; K. Yamamoto ; Y. Harada ; M. Kubota ; A. Rothchild ; T. Hoffmann ; S. Kubicek ; S. DeGendt ; M. Heyns ; A. Lauwers ; S. Biesemans ; J. Kittle
Pub. info.: Physics and technology of high-k gate dielectrics III.  pp.269-286,  2006.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(5)
2.

Technical Paper
Technical Paper
2. Influence of Metal Vapor on Transport Properties of Common Inert-Gas Mixtures
T. Hoffmann ; U. Riedel
Pub. info.: AIAA meeting papers on disc.  2008.  Reston, Va..  American Institute of Aeronautics and Astronautics
Title of ser.: AIAA Paper : AIAA Thermophysics Conference
Ser. no.: 2008