1.

Conference Proceedings
Conference Proceedings
1. Shape control using sidewall imaging
Su,B. ; Oshana,R. ; Menaker,M. ; Barak,Y. ; Shi,X.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.232-238,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Automated OPC optimization using in-line CD-SEM
Su,B. ; Menaker,M. ; Haas,N. ; Subramanian,R. ; Singh,B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.80-86,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
3.

Conference Proceedings
Conference Proceedings
3. Charging control through extraction field
Su,B. ; Harel,O.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.38-41,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
4.

Conference Proceedings
Conference Proceedings
4. Final CD control through slope/sidewall angle correlation with stepper defocus and electrical parametric
Campbell,R.L. ; Su,B. ; Seregely,T.L. ; Wallace,S. ; Schantz,F.H.
Pub. info.: Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK.  pp.91-99,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4405
5.

Conference Proceedings
Conference Proceedings
5. 193-nm photoresist shrinkage after electron-beam exposure
Su,B. ; Eytan,G. ; Romano,A.R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.695-706,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344