MULTISPECTRAL SPECTROSCOPIC ELLIPSOMETRY-A NEW TOOL FOR IN SITU SURFACE ANALYSIS

MULTISPECTRAL SPECTROSCOPIC ELLIPSOMETRY-A NEW TOOL FOR IN SITU SURFACE ANALYSIS

Author(s):

Publication title:

Laser and particle-beam chemical processing for microelectronics : symposium held December 1-3, 1987, Boston, Massachusetts, USA

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

101

Pub. Year:

1988

Page(from):

403

Page(to):

410

Pages:

8

Pub. info.:

Pittsburgh, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9780931837692 [0931837693]

Language:

English

Call no.:

M23500/101

Type:

Conference Proceedings

Details

TDL ID:	ZA00015587
Series ID:	PA00000011
Conf. info. (Name):	Symposium on laser and particle-beam chemical processing for microelectronics
Conf. info. (Number):	1987
Conf. info. (Venue):	Boston, MA, USA
Conf. info. (Date):	1987.12.01-1987.12.03

Similar Items:

1 Conference Proceedings In Situ Real-Time Spectroscopic Ellipsometry Applied to the Surface Monitoring of Semiconductors Boher, P., Stehle, J. L. MRS - Materials Research Society	7 Conference Proceedings Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool Boher,P., Piel,J.P., Stehle,J.L., Pickering,C., Tarnowka,A. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Single-shot excimer laser annealing:a new tool for poly-AMLCD combined with spectroscopic ellipsometry Stehle,M.X., Zahorski,D., Stehle,J.L. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool Boher,P., Pickering,C., Tarnowka,A., Piel,J.-P., Evrard,P., Stehle,J.-L.P. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Real Time Spectroscopic Ellipsometry: A New Tool to Characterize SOI Wafers Boher, P., Piel, J.P., Stehle, J.L. Electrochemical Society	9 Conference Proceedings New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry Boher, P., Defranoux, C., Piel, J. P., Stehle, J. -L. P. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Surface Roughness Characterization of Au Thin Films by Spectroscopic Ellipsometry, Grazing X-ray Reflectance, Light Scattering and Scanning Tunneling Microscopy Boher, P., Stehle, J. L. MRS - Materials Research Society	10 Conference Proceedings New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry Boher,P., Defranoux,C., Piel,J.P., Stehle,J.L.P. SPIE - The International Society for Optical Engineering
5 Conference Proceedings High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry:a new tool for 300-mm-wafer technology Boher,P., Defranoux,C., Bourtault,S., Stehle,J.L.P. SPIE - The International Society for Optical Engineering	11 Conference Proceedings New versatile system for characterization of antireflective coatings using combined spectroscopic ellipsometry and grazing x-ray reflectance Boher,P., Evrard,P., Stehle,J.L.P. SPIE - The International Society for Optical Engineering
6 Conference Proceedings IN-SITU SPECTROSCOPIC ELLIPSOMETRY FOR THE CONTROL OF Si BASED THIN MULTI-LAYERS GROWN BY UHV-CVD Glowacki, F., Larre, A., Ferrieu, F., Campidelli, Y., Bensahel, D. MRS - Materials Research Society	12 Conference Proceedings Spectroscopic ellipsometry and photometry applied to color filter characterization Defranoux,C., Piel,J.P., Stehle,J.L. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12