Plasma pinch EUV source with particle injection
- Author(s):
Neumann, M. J. ( Univ. of Illinois at Urbana-Champaign (USA) ) Shin, H. ( Univ. of Illinois at Urbana-Champaign (USA) ) Qiu, H. ( Univ. of Illinois at Urbana-Champaign (USA) ) Ritz, E. ( Univ. of Illinois at Urbana-Champaign (USA) ) DeFrees, R. A. ( Univ. of Illinois at Urbana-Champaign (USA) ) Hendricks, M. R. ( Univ. of Illinois at Urbana-Champaign (USA) ) Alman, D. A. ( Univ. of Illinois at Urbana-Champaign (USA) ) Jurczyk, B. E. ( Univ. of Illinois at Urbana-Champaign (USA) ) Ruzic, D. N. ( Univ. of Illinois at Urbana-Champaign (USA) ) Bristol, R. ( Intel Components Research (USA) ) - Publication title:
- Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5751
- Pub. Year:
- 2005
- Page(from):
- 556
- Page(to):
- 562
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457318 [0819457310]
- Language:
- English
- Call no.:
- P63600/5751-1
- Type:
- Conference Proceedings
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