Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node
- Author(s):
A. Nackaerts ( IMEC (Belgium) ) S. Verhaegen ( IMEC (Belgium) ) M. Dusa ( ASML Netherlands B.V. (Netherlands) ) H. Kattouw ( ASML Netherlands B.V. (Netherlands) ) F. van Bilsen ( ASML Netherlands B.V. (Netherlands) ) S. Biesemans ( IMEC (Belgium) ) G. Vandenberghe ( IMEC (Belgium) ) - Publication title:
- Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6521
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466402 [0819466409]
- Language:
- English
- Call no.:
- P63600/6521
- Type:
- Conference Proceedings
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