1.

Conference Proceedings
Conference Proceedings
1. Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
Magg,C. ; Lercel,M.J. ; Lawliss,M. ; Ackel,R. ; Caldwell,N. ; Kindt,L. ; Racette,K.C. ; Williams,C. ; Reu,P.L.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.374-382,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Next-generation lithography mask development at the NGL-MCOC
Lercel,M.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Collins,K.W. ; Barrett,M. ; Trybendis,M.J. ; Bouchard,L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.105-115,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
3.

Conference Proceedings
Conference Proceedings
3. Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
Chey,S.J. ; Guarnieri,C.R. ; Babich,K. ; Pope,K.R. ; Goldfarb,D. ; Angelopoulos,M. ; Racette,K.C. ; Hibbs,M.S. ; Gibson,M.L. ; Kimmel,K.R.
Pub. info.: Optical Microlithography XIV.  4346  pp.798-805,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks
Racette,K.C. ; Williams,C.T. ; Lercel,M.J.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.883-892,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562