Top-surface imaging through silylation
- Author(s):
Postnikov,S.V. ( Univ.of Texas at Austin ) Somervell,M.H. ( Univ.of Texas at Austin ) Henderson,C.L. ( Univ.of Texas at Austin ) Katz,S. ( Univ.of Texas at Austin ) Willson,C.G. ( Univ.of Texas at Austin ) Byers,J.D. ( SEMATECH ) Qin,A. ( LSI Logic,Inc. ) Lin,Q. ( IBM East Fishkill ) - Publication title:
- Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3333
- Pub. Year:
- 1998
- Vol.:
- Part 2
- Page(from):
- 997
- Page(to):
- 1008
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427786 [0819427780]
- Language:
- English
- Call no.:
- P63600/3333
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Using alicyclic polymers in top surface imaging systems to reduce line-edge roughness
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Positive- and negative-tone water-processable photoresists: a progress report
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
9
Conference Proceedings
Improving the performance of 193-nm photoresists based on alicyclic polymers
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Tailoring of isolation structures with top-surface imaging process by silylation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |