Characterization of 193-nm resists for optical mask manufacturing
- Author(s):
- Fosshaug, H. ( Micronic Laser Systems AB (Sweden) )
- Paulsson, A. ( Micronic Laser Systems AB (Sweden) )
- Berzinsh, U. ( Micronic Laser Systems AB (Sweden) )
- Magnusson, H. ( Micronic Laser Systems AB (Sweden) )
- Publication title:
- 24th Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5567
- Pub. Year:
- 2004
- Page(from):
- 1256
- Page(to):
- 1267
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819455130 [081945513X]
- Language:
- English
- Call no.:
- P63600/5567-2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Managing effects in CD control from PED and PEB in advanced DUV photomask manufacturing using FEP-171 resist
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Evaluation of attenuated PSM photomask blanks with TF11 chrome and FEP-171 resist on a 248 nm DUV laser pattern generator
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Mask manufacturing contribution on 248-nm and 193-nm lithography performances
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Silsesquioxane-based 193 nm bilayer resists: characterization and lithographic evaluation
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Mask manufacturing contribution on 248-nm and 193-nm lithography performances
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
6
Conference Proceedings
Self-aligned resist patterning with 172nm and 193nm backside flood exposure on attenuated phase shift masks
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |