EFFECTS OF DRYING METHODS AND WETTABILITY OF SILICON ON THE FORMATION OF WATER MARKSIN SEMICONDUCTOR PROCESSING
- Author(s):
- Park, J.-G.
- Publication title:
- Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 1994-9
- Pub. Year:
- 1994
- Page(from):
- 228
- Page(to):
- 240
- Pages:
- 13
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770415 [1566770416]
- Language:
- English
- Call no.:
- E23400/941386
- Type:
- Conference Proceedings
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