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11 results

Conference Proceedings

1. Development and Application of High Cr-High Si-Fe-Ni Alloys to High Efficiency Waste-To-Energy Boilers

Kawahara, Y. ; Sasaki, K. ; Nakagawa, Y.

Pub. info.:	High-temperature oxidation and corrosion 2005 : proceedings of the International Symposium on High-Temperature Oxidation and Corrosion 2005 , Nara, Japan, 30th November - 2nd December 2005. pp.513-522, 2006. Uetikon-Zuerich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	522-523

Conference Proceedings

2. Simultaneous visualization of contact microscopic image and energetic charged particle tracks and its application to medicine

Amemiya, K. ; Takahashi, H. ; Naruse, T. ; Nakazawa, M. ; Yanagie, H. ; Hisa, T. ; Eriguchi, M. ; Nakagawa, Y. ; Majima, T. ; Kageji, T. ; Sakurai, Y. ; Kobayashi, T. ; Konishi, T. ; Hieda, K. ; Yasuda, N. ; Ogura, K.

Pub. info.:	Nanobiophotonics and biomedical applications : 26-27 January 2004, San Jose, California, USA. pp.44-51, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5331

Conference Proceedings

3. Effect of N2 Plasma Treatments on Dry Etch Damage in n- and p-type GaN

Kent, D. G. ; Lee, K.P. ; Zhang, A. P. ; Luo, B. ; Overberg, M.E. ; Abernathy, C. R. ; Ren, F. ; Mackenzie, K. D. ; Pearton, S.J. ; Nakagawa, Y.

Pub. info.:	GaN and related alloys - 2000 : symposium held November 27-December 1, 2000, Boston, Massachusetts, U.S.A.. 2001. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	639

Conference Proceedings

4. A Green Route to Epoxides: Catalytic Selective Epoxidation of Alkenes with 1 atm Molecular Oxygen with 10000 Turnover Number

Niashiyama, Y. ; Harashi, T. ; Nakagawa, Y. ; Mizuno, N.

Pub. info.:	Science and technology in catalysis 2002 : proceedings of the Fourth Tokyo Conference on Advanced Catalytic Science and Technology, Tokyo, July 14-19, 2002. pp.255-258, 2003. Amsterdam. Elsevier
Title of ser.:	Studies in surface science and catalysis
Ser. no.:	145

Conference Proceedings

5. Seed-Layer Deposition For Sub 0.25 Micron Cu Metallization Using A Line Cusp Magnetron Plasma Source

Wickramanayaka, S. ; Nagahama, H. ; Watanabe, E. ; Hayashi, T. ; Sato, M. ; Nakagawa, Y. ; Hasegawa, S. ; Mizuno, S. ; Numasawa, Y.

Pub. info.:	Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.. pp.D6.3-, 2001. Warrendale, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	612

Technical Paper

6. Exhaust Gas Turn Flow Construction in Catalyst Unit for Improvement of Purification Rate by Metal Honeycomb Substrate.

Nakagawa, Y. ; Takada, Y. ; Shimada, N.

Pub. info.:	2007 Small Engine Technology Conference and Exhibition : SAE technical paper. 2007. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2007

Technical Paper

7. Interconnection Technology for Engine Generators.

Kotani, Y. ; Shinogi, Y. ; Nakada, Y. ; Nakagawa, Y.

Pub. info.:	2003 Small Engine Technology Conference and Exhibition : SAE technical paper. 2003. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2003

Conference Proceedings

8. Experimental characterization of constituent errors in electron-beam lithography [6283-17]

Cinque, R. ; Buck, P. ; Yei, S. K. ; Komagata, T. ; Nakagawa, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831M-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

9. Development of an e-beam lithography system for 100- to 90-nm node reticles

Komagata, T. ; Kawase, Y. ; Nakagawa, Y. ; Gotoh, N. ; Tanaka, K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.328-338, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

10.

Conference Proceedings

10. High-alignment-accuracy EB writing of phase shift image for 65-nm node masks

Kimura, N. ; Komagata, T. ; Nakagawa, Y. ; Gotoh, N. ; Tanaka, K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.675-680, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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