Picosecond laser system for photomask repair with nanometer accuracy
- Author(s):
- Togawa, T. ( NEC Corp. (Japan) )
- Ueda, A.
- Morishige, Y.
- Suzuki, Y.
- Publication title:
- Third International Symposium on Laser Precision Microfabrication : proceedings : 27-31 May, 2002, Osaka, Japan
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4830
- Pub. Year:
- 2003
- Page(from):
- 346
- Page(to):
- 351
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446015 [0819446017]
- Language:
- English
- Call no.:
- P63600/4830
- Type:
- Conference Proceedings
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