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Scanning Probe Microscopy (SPM) for the Investigation of Local Electrical Properties of High-K Dielectric/Ferroelectric Films

Author(s):
Landau, S. A.
Weiss, P-A.
Junghans, N.
Kolbesen, B. O.
Adderton, D.
Schindler, G.
Hartner, W.
Hintermaier, F.
Dehm, C.
Mazure, C.
5 more
Publication title:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.
Title of ser.:
Materials Research Society symposium proceedings
Ser. no.:
567
Pub. Year:
1999
Page(from):
567
Pub. info.:
Warrendale, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994744 [1558994742]
Language:
English
Call no.:
M23500/567
Type:
Conference Proceedings

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