1.

Conference Proceedings
Conference Proceedings
1. Cross-sectional critical shape error: a novel methodology for quantifying process simulation accuracy
Mason,M.E. ; Soper,R.A.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.729-738,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Mechanical distortions in advanced optical reticles
Mikkelson,A.R. ; Engelstad,R.L. ; Lovell,E.G. ; Bloomstein,T.M. ; Mason,M.E.
Pub. info.: Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California.  Part2  pp.744-755,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3676
3.

Conference Proceedings
Conference Proceedings
3. Study of integration issues in shallow trench isolation for deep submicron CMOS technologies
Chatterjee,A. ; Mason,M.E. ; Joyner,K. ; Rogers,D. ; Mercer,D. ; Kuehne,J. ; Esquivel,A.L. ; Mei,P. ; Murtaza,S.S. ; Taylor,K.J. ; Ali,I. ; Nag,S. ; O'Brien,S. ; Ashburn,S.
Pub. info.: Microelectronic Device and Multilevel Interconnection Technology II.  pp.39-47,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2875
4.

Conference Proceedings
Conference Proceedings
4. Process-specific tuning of lithography simulation tools
Mason,M.E. ; Soper,R.A. ; Terry,R.M. ; Mack,C.A.
Pub. info.: Optical Microlithography X.  pp.491-498,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
5.

Conference Proceedings
Conference Proceedings
5. Improved method for the automated determination of E0 for lithography SPC
Mason,M.E. ; Soper,R.A. ; Garza,C.M.
Pub. info.: Optical Microlithography IX.  Part2  pp.847-858,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726