Blank Cover Image

Characterization of photo-acid redeposition in 193-nm photoresists

Author(s):
T. Wallow ( Advanced Micro Devices, Inc. (USA) )
M. Plat ( Spansion LLC. (USA) )
Z. Zhang ( Spansion LLC. (USA) )
B. MacDonald ( Spansion LLC. (USA) )
J. Bernard ( Spansion LLC. (USA) )
J. Romero ( Spansion LLC. (USA) )
B. L. Fontaine ( Advanced Micro Devices, Inc. (USA) )
H. J. Levinson ( Advanced Micro Devices, Inc. (USA) )
3 more
Publication title:
Advances in resist materials and processing technology XXIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6519
Pub. Year:
2007
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819466389 [0819466387]
Language:
English
Call no.:
P63600/6519
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

T. Wallow, A. Acheta, Y. Ma, A. Pawloski, S. Bell, B. Ward, C. Tabery, B. L. Fontaine, R. Kim, S. McGowan, H. J. …

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

O. Kritsun, B. L. Fontaine, R. Sandberg, A. Acheta, H. J. Levinson, K. Lensing, M. Dusa, J. Hauschild, A. Pici, C. …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Double exposure using 193nm negative tone photoresist

R. Kim, T. Wallow, J. Kye, H. J. Levinson, D. White

SPIE - The International Society of Optical Engineering
8 Conference Proceedings 193-nm negative resist based on acid-catalyzed elimination of polar molecules

Sooriyakumaran, R., Davis, B.W., Larson, C.E., Brock, P.J., DiPietro, R.A., Wallow, T.I., Connor, E.F., Sundberg, L.K., …

SPIE - The International Society of Optical Engineering
3 Conference Proceedings The transfer of photoresist LER through etch [6153-45]

Pawloski, A. R., Acheta, A., Bell, S., La Fontaine, B., Wallow, T., Levinson, H. J.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Impact of photo-induced species in O2-containing gases on lithographic patterning at 193-nm wavelength

Okoroanyanwu, U., Kunze, P., Al-Shamery, K.H., Romero, J., Bernard, J.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Characterization of line-edge roughness in photoresist using an image fading technique

Pawloski, A.R., Acheta, A., Lalovic, I., Fontaine, B.M.L., Levinson, H.J.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Impact of optical absorption on process control for sub-0.15-ｦﾌm device patterning using 193-nm lithography

Okoroanyanwu,U., Levinson,H.J., Romero,J., Singh,B., Lee,S.-J.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Approaches to etch-resistant 193-nm photoresists: performance and prospects

Allen, R. D., Opitz, J., Ito, H., Wallow, T. I., Casmier, D. V., DiPietro, R. A., Brock, P. J., Breyta, G., …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Novel polymeric anionic photo-acid generators (PAGs) and photoresists for sub-100-nm patterning by 193-nm lithography

M. Wang, N. D. Jarnagin, W. Yueh, J. M. Roberts, M. Tapia-Tapia, N. Batina, K. E. Gonsalves

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Molecular weight tailoring in methacrylate 193-nm photoresists

Wallow, T. I., Brock, P. J., Truong, H., Allen, R. D., Opitz, J., Hofer, D. C.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Investigation of electron beam stabilization of 193-nm photoresists

Kim,M.-S., Park,J.-W., Kim,H.-J., Jun,B.-J., Gil,M.-G., Kim,B.-H., Ross,M.F., Livesay,W.R.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12