1.

Conference Proceedings
Conference Proceedings
1. Re-evaluating simple lambda-based design rules for low-K1 lithography process control
Postnikov,S.V. ; Lucas,K.D. ; Roman,B.J. ; Wimmer,K.
Pub. info.: Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California.  pp.901-912,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3998
2.

Conference Proceedings
Conference Proceedings
2. Model-based OPC for first-generation 193-nm lithography
Lucas,K.D. ; Word,J.C. ; Vandenberghe,G.N. ; Verhaegen,S. ; Jonckheere,R.M.
Pub. info.: Optical Microlithography XIV.  4346  pp.119-130,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
3.

Conference Proceedings
Conference Proceedings
3. ArF lithography options for 100-nm technologies
Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.179-190,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. 193-nm contact photoresist reflow feasibility study
Lucas,K.D. ; Slezak,M. ; Ercken,M. ; Roey,F.Van
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.725-736,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345