Nanometer Trackwidth Definition by E-Beam Lithography for Advanced Magnetic Recording Heads
- Author(s):
- Publication title:
- Magnetic Materials, Processes, and Devices VI, Applications to Storage and Microelectromechanical Systems (MEMS) : proceedings of the International Symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2000-29
- Pub. Year:
- 2000
- Page(from):
- 332
- Page(to):
- 342
- Pages:
- 11
- Pub. info.:
- Pennington, N.J.: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566772969 [1566772966]
- Language:
- English
- Call no.:
- E23400/200029
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Sub-l00 nm trackwidth development bye-beam lithography for advanced magnetic recording heads [6151-114]
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Electrochemical Society |
8
Conference Proceedings
Global CD uniformity improvement in mask manufacturing for advanced lithography
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
Electrochemical Society |
4
Conference Proceedings
Microstructures and Properties of High-Saturation Soft Magnetic Materials for Advanced Recording Heads
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
Kluwer Academic Publishers |
Electrochemical Society |
Materials Research Society |