1.

Conference Proceedings
Conference Proceedings
1. Next-generation lithography mask development at the NGL Mask Center of Competency
Lercel,M.J. ; Brooks,C.J. ; Racette,K.C. ; Magg,C. ; Lawliss,M. ; Caldwell,N. ; Jeffer,R. ; Collins,K.W. ; Barrett,M. ; Nash,S.C. ; Trybendis,M.J. ; Bouchard,L.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.804-813,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Performance of the EL-4+ maskwriter for advanced chrome on glass reticles
Caldwell,N. ; Jeffer,R. ; Lawliss,M. ; Hartley,J.G.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.493-500,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. X-ray mask image-placement studies at the Microlithography Mask Development Center
Puisto,D. ; Lawliss,M. ; Faure,T. ; rocque,J.M. ; Kimmel,K.R. ; Benoit,D.E.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.204-210,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723