1.

Conference Proceedings
Conference Proceedings
1. Strained Ge MOSFETs: Devices and Process Technology
Ritenour, A. ; Lee, M. ; Lu, N. ; Bai, W. ; Yu, S. ; Fitzgerald, E. ; Kwong, D.L. ; Antoniadis, D.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.406-411,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
2.

Conference Proceedings
Conference Proceedings
2. Characteristics of Ultra Thin (EOT<1 nm) RTCVD Zr Silicate (Zr 27Si 10O 63) Gate Dielectrics
Lee, C.H. ; Luan, H.F ; Bat, W.P. ; Lee, S.J. ; Jean, T.S. ; Roberts, D. ; Kwong, D.L.
Pub. info.: Rapid thermal and other short-time processing technologies II : proceedings of the international symposium.  pp.205-210,  2001.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2001-9
3.

Conference Proceedings
Conference Proceedings
3. New Reliability Issues of CMOS Transistors with 1.3nm Thick Gate Oxide
Cho, B.J. ; Chen, G. ; Loh, W.Y. ; Kwong, D.L.
Pub. info.: Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium.  pp.228-240,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-2
4.

Conference Proceedings
Conference Proceedings
4. Challenges and Opportunities in High-K Gate Dielectric Technology
Niwa, M. ; Harada, Y. ; Yamamoto, K. ; Hayashi, S. ; Mitsuhashi, R. ; Eriguchi, K. ; Kubota, M. ; Hoshino, Y. ; Kido, Y ; Kwong, D.L.
Pub. info.: Rapid thermal and other short-time processing technologies III : proceedings of the international symposium.  pp.99-116,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-11