1.

Conference Proceedings
Conference Proceedings
1. DOPANT ENHANCED LOW-TEMPERATURE EPITAXIAL GROWTH BY RAPID THERMAL PROCESSING CHEMICAL VAPOR DEPOSITION
Hsieh, T.Y. ; Jung, K.H. ; Kwong, D.L.
Pub. info.: Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A..  pp.625-632,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 220
2.

Conference Proceedings
Conference Proceedings
2. RTP-CVD OF Si MATERIALS AND DEVICES FOR ULSI APPLICATIONS
Kwong, D.L. ; Hsieh, T.Y. ; Jung, K.H.
Pub. info.: Silicon molecular beam epitaxy : symposium held April 29-May 3, 1991, Anaheim, California, U.S.A..  pp.557-568,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 220
3.

Conference Proceedings
Conference Proceedings
3. COMPARISON OF THE DENSITY AND DISTRIBUTION OF TRAPS GENERATED BY HIGH VOLTAGE STRESS IN SILICON OXIDE AND SILICON OXYNITRIDES
Richardson, J.T. ; Dumin, D.J. ; Lo, G.Q. ; Kwong, D.L. ; Gross, B.J. ; Sodini, C.G.
Pub. info.: Amorphous insulating thin films : symposium held December 1-4, 1992, Boston, Massachusetts, U.S.A..  pp.357-362,  1993.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 284
4.

Conference Proceedings
Conference Proceedings
4. lssues on the In-Situ Cleaning of the Silicon Surface and the Process Conditions for Epitaxial Silicon Growth in an RTP CVD Systems
Wang, C.L. ; Unnikrishnan, S. ; Kim, B.Y. ; Kwong, D.L. ; Tasch, A.F.
Pub. info.: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.306-311,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-5
5.

Conference Proceedings
Conference Proceedings
5. Effect of Trace Oxygen on Selective Silicon Deposition in a Single-Wafer RTP CVD Reactor
Wang, C.L. ; Unnikrishnan, S. ; Kim, B.Y. ; Kwong, D.L. ; Tasch, A.F.
Pub. info.: Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition.  pp.312-317,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-5
6.

Conference Proceedings
Conference Proceedings
6. PHOTOLUMINESCENCE AND STRUCTURE OF CHEMICALLY ETCHED Si
Shih, S. ; Jung, K.H. ; Hsieh, T.Y. ; Sarathy, J. ; Tsai, C. ; Li, K.-H. ; Campbell, J.C. ; Kwong, D.L.
Pub. info.: Light emission from silicon : symposium held December 3-5, 1991, Boston, Massachusetts, U.S.A..  pp.27-30,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 256
7.

Conference Proceedings
Conference Proceedings
7. STRUCTURE AND COMPOSITION OF LUMINESCENT LATERALLY ANODIZED POROUS Si
Jung, K.H. ; Shih, S. ; Hsieh, T.Y. ; Campbell, J.C. ; Kwong, D.L. ; George, T. ; Lin, T.L. ; Liu, H.Y. ; Zavada, J. ; Novak, S.
Pub. info.: Light emission from silicon : symposium held December 3-5, 1991, Boston, Massachusetts, U.S.A..  pp.31-34,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 256
8.

Conference Proceedings
Conference Proceedings
8. Modeling of High Dose Implanted Boron Diffusion During RTA
Su, T. ; Chol, P. ; Chang, R.D. ; Kwong, D.L.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.172-178,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4
9.

Conference Proceedings
Conference Proceedings
9. Post-Implant Anneal: Fundamental Differences in Dopant Diffusion and Activation Due to Rapid Thermal Annealing/Furnace Annealing
Choi, P.S. ; Sn, T. ; Chang, R.D. ; Kwong, D.L.
Pub. info.: Proceedings of the Fourth International Symposium on Process Physics and Modeling in Semiconductor Technology.  pp.149-154,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-4
10.

Conference Proceedings
Conference Proceedings
10. RPT N20 Oxides For Non-Volatile Memory Applications
Gardner, M. ; Fulford, J. ; Bhat, M. ; Kwong, D.L.
Pub. info.: Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films.  pp.357-362,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-16