1.

Conference Proceedings
Conference Proceedings
1. Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography
Kim,S.-K. ; Kim,Y.-S. ; Kim,J.-S. ; Bok,C.-K. ; Ham,Y.-M. ; Baik,K.-H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.435-442,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography
Ham,Y.-M. ; Kim,S.-K. ; Kim,S.-J. ; Hur,C. ; Kim,Y.-S. ; Baik,K.-H. ; Kim,B.-H. ; Ahn,D.-J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1053-1061,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Feasibility study of printing sub-100-nm with ArF lithography
Kim,S.-K. ; Hong,J.-G. ; Park,J.-O. ; Yoo,T.-J. ; Hyun,Y.-S. ; Bok,C.-K. ; Shin,K.-S.
Pub. info.: Optical Microlithography XIV.  4346  pp.214-221,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. 3D display system for one observer using multiprojection of two-dimensional images from an arc
Kim,S.-K. ; Kajiki,Y. ; Honda,T.
Pub. info.: Stereoscopic Displays and Virtual Reality Systems VIII.  pp.141-147,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4297