1.

Conference Proceedings
Conference Proceedings
1. The Effect of In -Situ N2/H2 Plasma Treatment on the Properties of Chemically Vapor Deposited TiN
Kim, D.-H. ; Park, J.W. ; Kim, J.J.
Pub. info.: Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11.  pp.1626-1634,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-25
2.

Conference Proceedings
Conference Proceedings
2. THE SLOPE ETCHING OF a-Si:H FILM USING CF4 + O2 GAS
Sung, K.H. ; Park, B.W. ; Kim, J.I. ; Kim, J.J. ; Bae, H.K. ; Park, Y.H. ; Hur, C.W.
Pub. info.: Amorphous silicon technology 1991 : symposium held April 30-May 3, 1991, Anaheim, California, U.S.A..  pp.811-818,  1991.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 219