Device and process technologies for MEMS and Microelectronics II : 17-19 December 2001, Adelaide, Australia. pp.428-435, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003. pp.12-17, 2003. Zuerich, Switzerland. Trans Tech Publications
Noh, C.-H. ; Kim, J.-Y. ; Lee, H.-C. ; Hwang, O.-C. ; Cho, S.-H. ; Song, K.-Y. ; Kim, J.-M.
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Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.269-280, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kim, H.-S. ; Kim, J.-M. ; Oshikawa, T. ; Ikeda, K.
Pub. info.:
Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003. pp.180-185, 2003. Zuerich, Switzerland. Trans Tech Publications
Device and process technologies for MEMS, microelectronics, and photonics III : 10-12 December 2003, Perth, Australia. pp.11-18, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Eco-materials processing & design : ISEPD-4, proceedings of the 4th International Symposium on Eco-Materials Processing & Design, Gyungpodae, Korea, February 4-6, 2003. pp.137-142, 2003. Zuerich, Switzerland. Trans Tech Publications
Park, E.-S. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.
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Photomask and Next-Generation Lithography Mask Technology XII. pp.58-65, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology XII. pp.20-30, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kim, D.-W. ; Lee, J.-K. ; Koo, S.H. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.
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Photomask and Next-Generation Lithography Mask Technology X. pp.484-495, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering