Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.307-, 1999. Warrendale, PA. MRS - Materials Research Society
Pomarede, C. ; Werkhoven, C. ; Weidmann, J. ; Bergman, T. ; Gschwandtner, A. ; Houssa, M.
Pub. info.:
Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.147-, 1999. Warrendale, PA. MRS - Materials Research Society